中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
A modification of formulas used in SOI capacitors analysis and its application in total dose radiation

文献类型:期刊论文

作者Gao, JX ; Yu, XF ; Zhang, M ; Lin, CL ; Yan, RL
刊名RADIATION EFFECTS AND DEFECTS IN SOLIDS
出版日期1998
卷号145期号:4页码:307-317
关键词SIMOX BURIED OXIDES SILICON-ON-INSULATOR OXYGEN IMPLANT DEVICES
ISSN号1042-0150
通讯作者Gao, JX, Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, 865 Chang Ning Rd, Shanghai 200050, Peoples R China
学科主题Nuclear Science & Technology; Physics, Condensed Matter
收录类别SCI
语种英语
公开日期2012-03-25
源URL[http://ir.sim.ac.cn/handle/331004/98927]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文(1999年以前)
推荐引用方式
GB/T 7714
Gao, JX,Yu, XF,Zhang, M,et al. A modification of formulas used in SOI capacitors analysis and its application in total dose radiation[J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS,1998,145(4):307-317.
APA Gao, JX,Yu, XF,Zhang, M,Lin, CL,&Yan, RL.(1998).A modification of formulas used in SOI capacitors analysis and its application in total dose radiation.RADIATION EFFECTS AND DEFECTS IN SOLIDS,145(4),307-317.
MLA Gao, JX,et al."A modification of formulas used in SOI capacitors analysis and its application in total dose radiation".RADIATION EFFECTS AND DEFECTS IN SOLIDS 145.4(1998):307-317.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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