中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Defect distribution and evolution in He+ implanted Si studied by variable-energy positron beam

文献类型:期刊论文

作者Zhang, M ; Lin, CL ; Weng, HM ; Scholz, R ; Gosele, U
刊名THIN SOLID FILMS
出版日期1998
卷号333期号:1-2页码:245-250
关键词ANNIHILATION SPECTROSCOPY INDUCED CAVITIES SILICON VOIDS METALS
ISSN号0040-6090
通讯作者Zhang, M, Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
学科主题Materials Science, Multidisciplinary; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter
收录类别SCI
语种英语
公开日期2012-03-25
源URL[http://ir.sim.ac.cn/handle/331004/98959]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文(1999年以前)
推荐引用方式
GB/T 7714
Zhang, M,Lin, CL,Weng, HM,et al. Defect distribution and evolution in He+ implanted Si studied by variable-energy positron beam[J]. THIN SOLID FILMS,1998,333(1-2):245-250.
APA Zhang, M,Lin, CL,Weng, HM,Scholz, R,&Gosele, U.(1998).Defect distribution and evolution in He+ implanted Si studied by variable-energy positron beam.THIN SOLID FILMS,333(1-2),245-250.
MLA Zhang, M,et al."Defect distribution and evolution in He+ implanted Si studied by variable-energy positron beam".THIN SOLID FILMS 333.1-2(1998):245-250.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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