Structural characterization of codeposition growth beta-FeSi2 film
文献类型:期刊论文
作者 | Lin, CG ; Wang, LW ; Chen, XD ; Chen, LF ; Wang, LM |
刊名 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
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出版日期 | 1998 |
卷号 | 37期号:2页码:622-625 |
关键词 | OPTICAL-TRANSITION THIN-FILMS DISILICIDE MOSSBAUER EPITAXY FESI2 |
ISSN号 | 0021-4922 |
通讯作者 | Lin, CG, Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China |
学科主题 | Physics, Applied |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2012-03-25 |
源URL | [http://ir.sim.ac.cn/handle/331004/99024] ![]() |
专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文(1999年以前) |
推荐引用方式 GB/T 7714 | Lin, CG,Wang, LW,Chen, XD,et al. Structural characterization of codeposition growth beta-FeSi2 film[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,1998,37(2):622-625. |
APA | Lin, CG,Wang, LW,Chen, XD,Chen, LF,&Wang, LM.(1998).Structural characterization of codeposition growth beta-FeSi2 film.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,37(2),622-625. |
MLA | Lin, CG,et al."Structural characterization of codeposition growth beta-FeSi2 film".JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 37.2(1998):622-625. |
入库方式: OAI收割
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