中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Structural characterization of codeposition growth beta-FeSi2 film

文献类型:期刊论文

作者Lin, CG ; Wang, LW ; Chen, XD ; Chen, LF ; Wang, LM
刊名JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
出版日期1998
卷号37期号:2页码:622-625
关键词OPTICAL-TRANSITION THIN-FILMS DISILICIDE MOSSBAUER EPITAXY FESI2
ISSN号0021-4922
通讯作者Lin, CG, Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
学科主题Physics, Applied
收录类别SCI
语种英语
公开日期2012-03-25
源URL[http://ir.sim.ac.cn/handle/331004/99024]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文(1999年以前)
推荐引用方式
GB/T 7714
Lin, CG,Wang, LW,Chen, XD,et al. Structural characterization of codeposition growth beta-FeSi2 film[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,1998,37(2):622-625.
APA Lin, CG,Wang, LW,Chen, XD,Chen, LF,&Wang, LM.(1998).Structural characterization of codeposition growth beta-FeSi2 film.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,37(2),622-625.
MLA Lin, CG,et al."Structural characterization of codeposition growth beta-FeSi2 film".JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 37.2(1998):622-625.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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