中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Growth of SiC thin films on (100) and (111) silicon by pulsed laser deposition combined with a vacuum annealing process

文献类型:期刊论文

作者Huang, JP ; Wang, LW ; Wen, U ; Wang, YX ; Lin, CL ; Zetterling, CM ; Ostling, M
刊名WIDE-BANDGAP SEMICONDUCTORS FOR HIGH-POWER, HIGH-FREQUENCY AND HIGH-TEMPERATURE APPLICATIONS-1999
出版日期1999
卷号572页码:207-212
关键词CHEMICAL-VAPOR-DEPOSITION CARBIDE TEMPERATURE DEVICES
ISSN号0272-9172
通讯作者Huang, JP, Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
学科主题Materials Science, Multidisciplinary
收录类别SCI
语种英语
公开日期2012-03-25
源URL[http://ir.sim.ac.cn/handle/331004/99115]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文(1999年以前)
推荐引用方式
GB/T 7714
Huang, JP,Wang, LW,Wen, U,et al. Growth of SiC thin films on (100) and (111) silicon by pulsed laser deposition combined with a vacuum annealing process[J]. WIDE-BANDGAP SEMICONDUCTORS FOR HIGH-POWER, HIGH-FREQUENCY AND HIGH-TEMPERATURE APPLICATIONS-1999,1999,572:207-212.
APA Huang, JP.,Wang, LW.,Wen, U.,Wang, YX.,Lin, CL.,...&Ostling, M.(1999).Growth of SiC thin films on (100) and (111) silicon by pulsed laser deposition combined with a vacuum annealing process.WIDE-BANDGAP SEMICONDUCTORS FOR HIGH-POWER, HIGH-FREQUENCY AND HIGH-TEMPERATURE APPLICATIONS-1999,572,207-212.
MLA Huang, JP,et al."Growth of SiC thin films on (100) and (111) silicon by pulsed laser deposition combined with a vacuum annealing process".WIDE-BANDGAP SEMICONDUCTORS FOR HIGH-POWER, HIGH-FREQUENCY AND HIGH-TEMPERATURE APPLICATIONS-1999 572(1999):207-212.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。