Preparation of AlN thin films by nitridation of Al-coated Si substrate
文献类型：期刊论文
| 作者 | Huang, JP ; Wang, LW ; Shen, QW ; Lin, CL ; Ostling, M |
| 刊名 | THIN SOLID FILMS
 |
| 出版日期 | 1999 |
| 卷号 | 340期号:1-2页码:137-139 |
| 关键词 | CHEMICAL-VAPOR-DEPOSITION PULSED-LASER DEPOSITION GROWTH |
| ISSN号 | 0040-6090 |
| 通讯作者 | Huang, JP, Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China |
| 学科主题 | Materials Science, Multidisciplinary; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-25 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/99159]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文（1999年以前) |
| 推荐引用方式 GB/T 7714 | Huang, JP,Wang, LW,Shen, QW,et al. Preparation of AlN thin films by nitridation of Al-coated Si substrate[J]. THIN SOLID FILMS,1999,340(1-2):137-139. |
| APA | Huang, JP,Wang, LW,Shen, QW,Lin, CL,&Ostling, M.(1999).Preparation of AlN thin films by nitridation of Al-coated Si substrate.THIN SOLID FILMS,340(1-2),137-139. |
| MLA | Huang, JP,et al."Preparation of AlN thin films by nitridation of Al-coated Si substrate".THIN SOLID FILMS 340.1-2(1999):137-139. |
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