Study of the contour-based optical proximity correction methodology
文献类型：期刊论文
| 作者 | Zhu, L ; Kang, XH ; Gu, YL ; Yang, S |
| 刊名 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
 |
| 出版日期 | 2009 |
| 卷号 | 8期号:4页码:43005-43005 |
| 关键词 | LITHOGRAPHY OPC SIMULATION DESIGN |
| ISSN号 | 1537-1646 |
| 通讯作者 | Zhu, L, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China |
| 学科主题 | Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Optics |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/94894]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zhu, L,Kang, XH,Gu, YL,et al. Study of the contour-based optical proximity correction methodology[J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,2009,8(4):43005-43005. |
| APA | Zhu, L,Kang, XH,Gu, YL,&Yang, S.(2009).Study of the contour-based optical proximity correction methodology.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,8(4),43005-43005. |
| MLA | Zhu, L,et al."Study of the contour-based optical proximity correction methodology".JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 8.4(2009):43005-43005. |
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