中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The microstructure investigation of GeTi thin film used for non-volatile memory

文献类型:期刊论文

作者Shen, J ; Liu, B ; Song, ZT ; Xu, C ; Liang, S ; Feng, SL ; Chen, BM
刊名APPLIED SURFACE SCIENCE
出版日期2008
卷号254期号:15页码:4638-4643
关键词RANDOM-ACCESS MEMORY PHASE-CHANGE NEGATIVE RESISTANCE SWITCHING PHENOMENA GE2SB2TE5 FILM OXIDE-FILMS GLASSES TRANSITION
ISSN号0169-4332
通讯作者Shen, J, Chinese Acad Sci, Lab Nanotechnol, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
学科主题Chemistry, Physical; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/94938]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Shen, J,Liu, B,Song, ZT,et al. The microstructure investigation of GeTi thin film used for non-volatile memory[J]. APPLIED SURFACE SCIENCE,2008,254(15):4638-4643.
APA Shen, J.,Liu, B.,Song, ZT.,Xu, C.,Liang, S.,...&Chen, BM.(2008).The microstructure investigation of GeTi thin film used for non-volatile memory.APPLIED SURFACE SCIENCE,254(15),4638-4643.
MLA Shen, J,et al."The microstructure investigation of GeTi thin film used for non-volatile memory".APPLIED SURFACE SCIENCE 254.15(2008):4638-4643.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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