Effect of nanoclusters induced by Si implantation on total dose radiation response of a SOI wafer
文献类型：期刊论文
| 作者 | Wu,AM ; Chen,J ; Zhang,EX ; Wang,X ; Zhang,ZX |
| 刊名 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY
 |
| 出版日期 | 2008 |
| 卷号 | 23期号:1页码:15015-15015 |
| 关键词 | RAY PHOTOELECTRON-SPECTROSCOPY INTERFACE TRAPS IRRADIATION NANOCRYSTALS TRANSISTORS OXIDES LAYERS HOLE |
| ISSN号 | 0268-1242 |
| 通讯作者 | Wu, AM, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China |
| 学科主题 | Engineering ; Electrical & Electronic; Materials Science ; Multidisciplinary; Physics ; Condensed Matter |
| 收录类别 | SCI |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/94941]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Wu,AM,Chen,J,Zhang,EX,et al. Effect of nanoclusters induced by Si implantation on total dose radiation response of a SOI wafer[J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY,2008,23(1):15015-15015. |
| APA | Wu,AM,Chen,J,Zhang,EX,Wang,X,&Zhang,ZX.(2008).Effect of nanoclusters induced by Si implantation on total dose radiation response of a SOI wafer.SEMICONDUCTOR SCIENCE AND TECHNOLOGY,23(1),15015-15015. |
| MLA | Wu,AM,et al."Effect of nanoclusters induced by Si implantation on total dose radiation response of a SOI wafer".SEMICONDUCTOR SCIENCE AND TECHNOLOGY 23.1(2008):15015-15015. |
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