Fabrication of thin-film silicon on insulator by separation by implanted oxygen layer transfer
文献类型：期刊论文
| 作者 | Wei, X ; Wu, AM ; Chen, M ; Chen, J ; Zhang, M ; Wang, X ; Lin, CL |
| 刊名 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
 |
| 出版日期 | 2008 |
| 卷号 | 26期号:6页码:L45-L47 |
| 关键词 | LOW-DOSE SEPARATION BURIED-OXIDE THERMAL-OXIDATION WAFERS |
| ISSN号 | 1071-1023 |
| 通讯作者 | Zhang, M, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Infromat, Shanghai 200050, Peoples R China |
| 学科主题 | Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/94984]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Wei, X,Wu, AM,Chen, M,et al. Fabrication of thin-film silicon on insulator by separation by implanted oxygen layer transfer[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2008,26(6):L45-L47. |
| APA | Wei, X.,Wu, AM.,Chen, M.,Chen, J.,Zhang, M.,...&Lin, CL.(2008).Fabrication of thin-film silicon on insulator by separation by implanted oxygen layer transfer.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,26(6),L45-L47. |
| MLA | Wei, X,et al."Fabrication of thin-film silicon on insulator by separation by implanted oxygen layer transfer".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 26.6(2008):L45-L47. |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。