Colloidal nano-abrasives and slurry for chemical-mechanical polishing of semiconductor materials
文献类型：期刊论文
| 作者 | Zhang, KL ; Song, ZT ; Lin, CL ; Feng, SF ; Chen, B |
| 刊名 | JOURNAL OF CERAMIC PROCESSING RESEARCH
 |
| 出版日期 | 2007 |
| 卷号 | 8期号:1页码:52-55 |
| 关键词 | PLANARIZATION |
| ISSN号 | 1229-9162 |
| 通讯作者 | Zhang, KL, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Lab Nano Technol, Res Ctr Funct Semicond Film Engn & Technol, Shanghai 200050, Peoples R China |
| 学科主题 | Materials Science, Ceramics |
| 收录类别 | SCI |
| 原文出处 | http://apps.webofknowledge.com/full_record.do?product=WOS&search_mode=GeneralSearch&qid=43&SID=Z1inl9pjJoL49g8jCge&page=1&doc=1 |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/95035]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zhang, KL,Song, ZT,Lin, CL,et al. Colloidal nano-abrasives and slurry for chemical-mechanical polishing of semiconductor materials[J]. JOURNAL OF CERAMIC PROCESSING RESEARCH,2007,8(1):52-55. |
| APA | Zhang, KL,Song, ZT,Lin, CL,Feng, SF,&Chen, B.(2007).Colloidal nano-abrasives and slurry for chemical-mechanical polishing of semiconductor materials.JOURNAL OF CERAMIC PROCESSING RESEARCH,8(1),52-55. |
| MLA | Zhang, KL,et al."Colloidal nano-abrasives and slurry for chemical-mechanical polishing of semiconductor materials".JOURNAL OF CERAMIC PROCESSING RESEARCH 8.1(2007):52-55. |
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