Influence of N-2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering
文献类型：期刊论文
| 作者 | Yuan, LY ; Fang, GJ ; Li, C ; Wang, MJ ; Liu, NS ; Lei, A ; Cheng, YZ ; Gao, HM ; Zhao, XZ |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2007 |
| 卷号 | 253期号:20页码:8538-8542 |
| 关键词 | HF-N FILMS GATE-ELECTRODE PHYSICAL-PROPERTIES METAL NITRIDE OXIDE RESISTIVITY MGO(001) DEVICES GROWTH LAYERS |
| ISSN号 | 0169-4332 |
| 通讯作者 | Fang, GJ, Wuhan Univ, Minist Educ, Key Lab Acoust & Photon Mat & Devices, Wuhan 430072, Peoples R China |
| 学科主题 | Chemistry, Physical; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/95073]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Yuan, LY,Fang, GJ,Li, C,et al. Influence of N-2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering[J]. APPLIED SURFACE SCIENCE,2007,253(20):8538-8542. |
| APA | Yuan, LY.,Fang, GJ.,Li, C.,Wang, MJ.,Liu, NS.,...&Zhao, XZ.(2007).Influence of N-2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering.APPLIED SURFACE SCIENCE,253(20),8538-8542. |
| MLA | Yuan, LY,et al."Influence of N-2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering".APPLIED SURFACE SCIENCE 253.20(2007):8538-8542. |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。