Characterization of ultra-thin Y2O3 films as insulator of MFISFET structure
文献类型：期刊论文
| 作者 | Tang, MH ; Zhou, YC ; Zheng, XJ ; Yan, Z ; Cheng, CP ; Ye, Z ; Hu, ZS |
| 刊名 | TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA
 |
| 出版日期 | 2006 |
| 卷号 | 16页码:S63-S66 |
| 关键词 | ELECTRICAL CHARACTERISTICS SILICON SI EVAPORATION LAYERS SUBSTRATE GROWTH BUFFER |
| ISSN号 | 1003-6326 |
| 通讯作者 | Zhou, YC, Xiangtan Univ, Fac Mat & Optoelect Phys, Xiangtan 411105, Peoples R China |
| 学科主题 | Metallurgy & Metallurgical Engineering |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/95172]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Tang, MH,Zhou, YC,Zheng, XJ,et al. Characterization of ultra-thin Y2O3 films as insulator of MFISFET structure[J]. TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA,2006,16:S63-S66. |
| APA | Tang, MH.,Zhou, YC.,Zheng, XJ.,Yan, Z.,Cheng, CP.,...&Hu, ZS.(2006).Characterization of ultra-thin Y2O3 films as insulator of MFISFET structure.TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA,16,S63-S66. |
| MLA | Tang, MH,et al."Characterization of ultra-thin Y2O3 films as insulator of MFISFET structure".TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA 16(2006):S63-S66. |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。