中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
High-quality GaN film grown by HVPE with an anodized aluminum oxide mask

文献类型:期刊论文

作者Lei, BL ; Yu, GG ; Ye, HH ; Meng, S ; Qi, M ; Li, AZ
刊名ELECTROCHEMICAL AND SOLID STATE LETTERS
出版日期2006
卷号9期号:7页码:G242-G244
关键词VAPOR-PHASE EPITAXY THREADING DISLOCATIONS OPTICAL-PROPERTIES GALLIUM NITRIDE SAPPHIRE LAYERS REDUCTION TEMPLATES SI(111)
ISSN号1099-0062
通讯作者Lei, BL, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
学科主题Electrochemistry; Materials Science, Multidisciplinary
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/95205]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Lei, BL,Yu, GG,Ye, HH,et al. High-quality GaN film grown by HVPE with an anodized aluminum oxide mask[J]. ELECTROCHEMICAL AND SOLID STATE LETTERS,2006,9(7):G242-G244.
APA Lei, BL,Yu, GG,Ye, HH,Meng, S,Qi, M,&Li, AZ.(2006).High-quality GaN film grown by HVPE with an anodized aluminum oxide mask.ELECTROCHEMICAL AND SOLID STATE LETTERS,9(7),G242-G244.
MLA Lei, BL,et al."High-quality GaN film grown by HVPE with an anodized aluminum oxide mask".ELECTROCHEMICAL AND SOLID STATE LETTERS 9.7(2006):G242-G244.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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