中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Total dose radiation tolerance of phase change memory cell with GeSbTe alloy

文献类型:期刊论文

作者Wu, LC ; Liu, B ; Song, ZT ; Feng, GM ; Feng, SL ; Chen, B
刊名CHINESE PHYSICS LETTERS
出版日期2006
卷号23期号:9页码:2557-2559
关键词AMORPHOUS THIN-FILMS RANDOM-ACCESS MEMORY GE2SB2TE5 FILMS ELECTRICAL-PROPERTIES NONVOLATILE GE20TE80-XBIX IMPLANTATION TEMPERATURE TRANSITION
ISSN号0256-307X
通讯作者Wu, LC, Chinese Acad Sci, Lab Nanotechnol, Res Ctr Funct Semicond Film Engn & Technol, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
学科主题Physics, Multidisciplinary
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/95232]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Wu, LC,Liu, B,Song, ZT,et al. Total dose radiation tolerance of phase change memory cell with GeSbTe alloy[J]. CHINESE PHYSICS LETTERS,2006,23(9):2557-2559.
APA Wu, LC,Liu, B,Song, ZT,Feng, GM,Feng, SL,&Chen, B.(2006).Total dose radiation tolerance of phase change memory cell with GeSbTe alloy.CHINESE PHYSICS LETTERS,23(9),2557-2559.
MLA Wu, LC,et al."Total dose radiation tolerance of phase change memory cell with GeSbTe alloy".CHINESE PHYSICS LETTERS 23.9(2006):2557-2559.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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