Characterization and field-emission property of aligned porous carbon nanotube film by hydrogen-ion implantation
文献类型：期刊论文
| 作者 | Yu, WD ; Zhang, JH ; Wang, X ; Li, XM ; Gao, XD |
| 刊名 | APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
 |
| 出版日期 | 2005 |
| 卷号 | 81期号:1页码:169-172 |
| 关键词 | INSULATOR MATERIAL TECHNOLOGY SILICON DEPOSITION GROWTH ARRAYS |
| ISSN号 | 0947-8396 |
| 通讯作者 | Yu, WD, Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, 1295 Dingxi Rd, Shanghai 200050, Peoples R China |
| 学科主题 | Materials Science, Multidisciplinary; Physics, Applied |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/95271]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Yu, WD,Zhang, JH,Wang, X,et al. Characterization and field-emission property of aligned porous carbon nanotube film by hydrogen-ion implantation[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,2005,81(1):169-172. |
| APA | Yu, WD,Zhang, JH,Wang, X,Li, XM,&Gao, XD.(2005).Characterization and field-emission property of aligned porous carbon nanotube film by hydrogen-ion implantation.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,81(1),169-172. |
| MLA | Yu, WD,et al."Characterization and field-emission property of aligned porous carbon nanotube film by hydrogen-ion implantation".APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 81.1(2005):169-172. |
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