中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Self-organized Ge nanocrystals embedded in HfAlO fabricated by pulsed-laser deposition and application to floating gate memory

文献类型:期刊论文

作者Liu, WL ; Lee, PF ; Dai, JY ; Wang, J ; Chan, HLW ; Choy, CL ; Song, ZT ; Feng, SL
刊名APPLIED PHYSICS LETTERS
出版日期2005
卷号86期号:1页码:13110-13110
关键词CHEMICAL-VAPOR-DEPOSITION DEVICE HFO2 DIELECTRICS OXIDATION SIO2
ISSN号0003-6951
通讯作者Dai, JY, Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
学科主题Physics, Applied
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/95296]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Liu, WL,Lee, PF,Dai, JY,et al. Self-organized Ge nanocrystals embedded in HfAlO fabricated by pulsed-laser deposition and application to floating gate memory[J]. APPLIED PHYSICS LETTERS,2005,86(1):13110-13110.
APA Liu, WL.,Lee, PF.,Dai, JY.,Wang, J.,Chan, HLW.,...&Feng, SL.(2005).Self-organized Ge nanocrystals embedded in HfAlO fabricated by pulsed-laser deposition and application to floating gate memory.APPLIED PHYSICS LETTERS,86(1),13110-13110.
MLA Liu, WL,et al."Self-organized Ge nanocrystals embedded in HfAlO fabricated by pulsed-laser deposition and application to floating gate memory".APPLIED PHYSICS LETTERS 86.1(2005):13110-13110.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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