Microstructure and electrical properties of Al2O3-ZrO2 composite films for gate dielectric applications
文献类型：期刊论文
| 作者 | Zhu, M ; Chen, P ; Fu, RKY ; Liu, WL ; Lin, CL ; Chu, PK |
| 刊名 | THIN SOLID FILMS
 |
| 出版日期 | 2005 |
| 卷号 | 476期号:2页码:312-316 |
| 关键词 | CHEMICAL-VAPOR-DEPOSITION THERMAL-STABILITY ZRO2 FILMS SILICON LAYERS MECHANISM SI(100) SI(001) SI |
| ISSN号 | 0040-6090 |
| 通讯作者 | Chu, PK, City Univ Hong Kong, Dept Phys & Mat Sci, Tat Chee Ave, Kowloon, Hong Kong, Peoples R China |
| 学科主题 | Materials Science, Multidisciplinary; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/95309]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zhu, M,Chen, P,Fu, RKY,et al. Microstructure and electrical properties of Al2O3-ZrO2 composite films for gate dielectric applications[J]. THIN SOLID FILMS,2005,476(2):312-316. |
| APA | Zhu, M,Chen, P,Fu, RKY,Liu, WL,Lin, CL,&Chu, PK.(2005).Microstructure and electrical properties of Al2O3-ZrO2 composite films for gate dielectric applications.THIN SOLID FILMS,476(2),312-316. |
| MLA | Zhu, M,et al."Microstructure and electrical properties of Al2O3-ZrO2 composite films for gate dielectric applications".THIN SOLID FILMS 476.2(2005):312-316. |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。