Thermal stability of diamondlike carbon buried layer fabricated by plasma immersion ion implantation and deposition in silicon on insulator
文献类型：期刊论文
| 作者 | Di, ZF ; Huang, AP ; Fu, RKY ; Chu, PK ; Shao, L ; Hochbauer, T ; Nastasi, M ; Zhang, M ; Liu, WL ; Shen, QW ; Luo, ST ; Song, ZT ; Lin, CG |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 出版日期 | 2005 |
| 卷号 | 98期号:5页码:53502-53502 |
| 关键词 | DLC FILMS SPECTROSCOPY |
| ISSN号 | 0021-8979 |
| 通讯作者 | Chu, PK, CUNY, Dept Phys & Mat Sci, Tat Chee Ave, Kowloon, Hong Kong, Peoples R China |
| 学科主题 | Physics, Applied |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/95348]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Di, ZF,Huang, AP,Fu, RKY,et al. Thermal stability of diamondlike carbon buried layer fabricated by plasma immersion ion implantation and deposition in silicon on insulator[J]. JOURNAL OF APPLIED PHYSICS,2005,98(5):53502-53502. |
| APA | Di, ZF.,Huang, AP.,Fu, RKY.,Chu, PK.,Shao, L.,...&Lin, CG.(2005).Thermal stability of diamondlike carbon buried layer fabricated by plasma immersion ion implantation and deposition in silicon on insulator.JOURNAL OF APPLIED PHYSICS,98(5),53502-53502. |
| MLA | Di, ZF,et al."Thermal stability of diamondlike carbon buried layer fabricated by plasma immersion ion implantation and deposition in silicon on insulator".JOURNAL OF APPLIED PHYSICS 98.5(2005):53502-53502. |
入库方式： OAI收割
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