中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effect of annealing temperature on the microstructure and resistivity of Ge2Sb2Te5 films

文献类型:期刊论文

作者Liu, B ; Song, ZT ; Feng, SL ; Chen, B
刊名CHINESE PHYSICS LETTERS
出版日期2004
卷号21期号:6页码:1143-1146
关键词REVERSIBLE PHASE-TRANSITION AMORPHOUS THIN-FILMS ELECTRICAL-PROPERTIES TELLURIDE GLASSES MEMORY CRYSTALLIZATION SEMICONDUCTORS GE20TE80-XBIX
ISSN号0256-307X
通讯作者Liu, B, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Res Ctr Funct Semicond Film Engn & Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
学科主题Physics, Multidisciplinary
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/95370]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Liu, B,Song, ZT,Feng, SL,et al. Effect of annealing temperature on the microstructure and resistivity of Ge2Sb2Te5 films[J]. CHINESE PHYSICS LETTERS,2004,21(6):1143-1146.
APA Liu, B,Song, ZT,Feng, SL,&Chen, B.(2004).Effect of annealing temperature on the microstructure and resistivity of Ge2Sb2Te5 films.CHINESE PHYSICS LETTERS,21(6),1143-1146.
MLA Liu, B,et al."Effect of annealing temperature on the microstructure and resistivity of Ge2Sb2Te5 films".CHINESE PHYSICS LETTERS 21.6(2004):1143-1146.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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