中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Implant damage and redistribution of indium in indium-implanted thin silicon-on-insulator

文献类型:期刊论文

作者Chen, P ; An, ZH ; Zhu, M ; Fu, RKY ; Chu, PK ; Montgomery, N ; Biswas, S
刊名MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
出版日期2004
卷号114页码:251-254
关键词TRANSIENT ENHANCED DIFFUSION BURIED SIO2
ISSN号0921-5107
通讯作者Chu, PK, City Univ Hong Kong, Dept Phys & Mat Sci, Tat Chee Ave, Kowloon, Hong Kong, Peoples R China
学科主题Materials Science, Multidisciplinary; Physics, Condensed Matter
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/95434]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Chen, P,An, ZH,Zhu, M,et al. Implant damage and redistribution of indium in indium-implanted thin silicon-on-insulator[J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY,2004,114:251-254.
APA Chen, P.,An, ZH.,Zhu, M.,Fu, RKY.,Chu, PK.,...&Biswas, S.(2004).Implant damage and redistribution of indium in indium-implanted thin silicon-on-insulator.MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY,114,251-254.
MLA Chen, P,et al."Implant damage and redistribution of indium in indium-implanted thin silicon-on-insulator".MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY 114(2004):251-254.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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