中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Investigation of thermal property of novel DSOI MOSFETs fabricated with local SIMOX technique

文献类型:期刊论文

作者Lin,Xi ; He,Ping ; Tian,Lilin ; Li,Zhijian ; Dong,Yemin ; Chen,Meng ; Wang,Xi
刊名Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors
出版日期2003
卷号24期号:2页码:117-121
中文摘要DSOI, bulk-Si and SOI MOSFETs are fabricated on the same die successfully using local oxygen implantation process. The thermal properties of the three kinds of devices are described and compared from simulation and measurement. Both simulation and measure
收录类别SCI
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/95496]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Lin,Xi,He,Ping,Tian,Lilin,et al. Investigation of thermal property of novel DSOI MOSFETs fabricated with local SIMOX technique[J]. Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors,2003,24(2):117-121.
APA Lin,Xi.,He,Ping.,Tian,Lilin.,Li,Zhijian.,Dong,Yemin.,...&Wang,Xi.(2003).Investigation of thermal property of novel DSOI MOSFETs fabricated with local SIMOX technique.Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors,24(2),117-121.
MLA Lin,Xi,et al."Investigation of thermal property of novel DSOI MOSFETs fabricated with local SIMOX technique".Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors 24.2(2003):117-121.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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