中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Dielectric properties of AlN thin films formed by ion beam enhanced deposition

文献类型:期刊论文

作者Song,ZR ; Yu,YH ; Shen,DS ; Zou,SC ; Zheng,ZH ; Luo,EZ ; Xie,Z
刊名MATERIALS LETTERS
出版日期2003
卷号57期号:30页码:4643-4647
关键词SILICON GROWTH
ISSN号0167-577X
通讯作者Song, ZR, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Ion Beam Lab, Shanghai 200050, Peoples R China
学科主题Materials Science ; Multidisciplinary; Physics ; Applied
收录类别SCI
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/95529]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Song,ZR,Yu,YH,Shen,DS,et al. Dielectric properties of AlN thin films formed by ion beam enhanced deposition[J]. MATERIALS LETTERS,2003,57(30):4643-4647.
APA Song,ZR.,Yu,YH.,Shen,DS.,Zou,SC.,Zheng,ZH.,...&Xie,Z.(2003).Dielectric properties of AlN thin films formed by ion beam enhanced deposition.MATERIALS LETTERS,57(30),4643-4647.
MLA Song,ZR,et al."Dielectric properties of AlN thin films formed by ion beam enhanced deposition".MATERIALS LETTERS 57.30(2003):4643-4647.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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