Nanoscale silicon prepared on different substrates using electron-beam evaporation and their field-emission property
文献类型：期刊论文
| 作者 | Xie, XY ; Wan, Q ; Liu, WL ; Men, CL ; Lin, Q ; Lin, CL |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2003 |
| 卷号 | 217期号:1-4页码:39-42 |
| 关键词 | PHOTOLUMINESCENCE |
| ISSN号 | 0169-4332 |
| 通讯作者 | Xie, XY, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, 865 Changning Rd, Shanghai 200050, Peoples R China |
| 学科主题 | Chemistry, Physical; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/95547]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Xie, XY,Wan, Q,Liu, WL,et al. Nanoscale silicon prepared on different substrates using electron-beam evaporation and their field-emission property[J]. APPLIED SURFACE SCIENCE,2003,217(1-4):39-42. |
| APA | Xie, XY,Wan, Q,Liu, WL,Men, CL,Lin, Q,&Lin, CL.(2003).Nanoscale silicon prepared on different substrates using electron-beam evaporation and their field-emission property.APPLIED SURFACE SCIENCE,217(1-4),39-42. |
| MLA | Xie, XY,et al."Nanoscale silicon prepared on different substrates using electron-beam evaporation and their field-emission property".APPLIED SURFACE SCIENCE 217.1-4(2003):39-42. |
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