中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Characterization of nano-sized Si islands in buried oxide layer of SIMOX by Conducting AFM

文献类型:期刊论文

作者Chen, KW ; Yu, YH ; Luo, EZ ; Xie, Z ; Xu, JB ; Wilson, IH ; Bishop, WY ; Shen, DS
刊名CHEMICAL PHYSICS LETTERS
出版日期2003
卷号376期号:5-6页码:748-752
关键词ON-INSULATOR TECHNOLOGY
ISSN号0009-2614
通讯作者Chen, KW, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Ion Beam Lab, 865 Changning Rd, Shanghai 200050, Peoples R China
学科主题Chemistry, Physical; Physics, Atomic, Molecular & Chemical
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/95555]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Chen, KW,Yu, YH,Luo, EZ,et al. Characterization of nano-sized Si islands in buried oxide layer of SIMOX by Conducting AFM[J]. CHEMICAL PHYSICS LETTERS,2003,376(5-6):748-752.
APA Chen, KW.,Yu, YH.,Luo, EZ.,Xie, Z.,Xu, JB.,...&Shen, DS.(2003).Characterization of nano-sized Si islands in buried oxide layer of SIMOX by Conducting AFM.CHEMICAL PHYSICS LETTERS,376(5-6),748-752.
MLA Chen, KW,et al."Characterization of nano-sized Si islands in buried oxide layer of SIMOX by Conducting AFM".CHEMICAL PHYSICS LETTERS 376.5-6(2003):748-752.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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