中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Preferentially oriented and amorphous Ti, TiN and Ti/TiN diffusion barrier for Cu prepared by ion beam assisted deposition (IBAD)

文献类型:期刊论文

作者Chen, KW ; Yu, YH ; Mu, HC ; Luo, EZ ; Sundaravel, B ; Wong, SP ; Wilson, IH
刊名SURFACE & COATINGS TECHNOLOGY
出版日期2002
卷号151页码:434-439
关键词LAYERS
ISSN号0257-8972
通讯作者Chen, KW, Chinese Acad Sci, Shanghai Inst Met, Ion Beam Lab, 865 Chang Ning Rd, Shanghai 200050, Peoples R China
学科主题Materials Science, Coatings & Films; Physics, Applied
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/95607]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Chen, KW,Yu, YH,Mu, HC,et al. Preferentially oriented and amorphous Ti, TiN and Ti/TiN diffusion barrier for Cu prepared by ion beam assisted deposition (IBAD)[J]. SURFACE & COATINGS TECHNOLOGY,2002,151:434-439.
APA Chen, KW.,Yu, YH.,Mu, HC.,Luo, EZ.,Sundaravel, B.,...&Wilson, IH.(2002).Preferentially oriented and amorphous Ti, TiN and Ti/TiN diffusion barrier for Cu prepared by ion beam assisted deposition (IBAD).SURFACE & COATINGS TECHNOLOGY,151,434-439.
MLA Chen, KW,et al."Preferentially oriented and amorphous Ti, TiN and Ti/TiN diffusion barrier for Cu prepared by ion beam assisted deposition (IBAD)".SURFACE & COATINGS TECHNOLOGY 151(2002):434-439.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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