中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Defect and strain in hydrogen and helium coimplanted single-crystal silicon

文献类型:期刊论文

作者Duo, XZ ; Liu, WL ; Xing, S ; Zhang, M ; Fu, XR ; Lin, CL ; Hu, PG ; Wang, SX ; Wang, LM
刊名JOURNAL OF PHYSICS D-APPLIED PHYSICS
出版日期2001
卷号34期号:1页码:5-11
关键词INDUCED EXFOLIATION MECHANISM CAVITIES AU
ISSN号0022-3727
通讯作者Duo, XZ, Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
学科主题Physics, Applied
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/95701]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Duo, XZ,Liu, WL,Xing, S,et al. Defect and strain in hydrogen and helium coimplanted single-crystal silicon[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2001,34(1):5-11.
APA Duo, XZ.,Liu, WL.,Xing, S.,Zhang, M.,Fu, XR.,...&Wang, LM.(2001).Defect and strain in hydrogen and helium coimplanted single-crystal silicon.JOURNAL OF PHYSICS D-APPLIED PHYSICS,34(1),5-11.
MLA Duo, XZ,et al."Defect and strain in hydrogen and helium coimplanted single-crystal silicon".JOURNAL OF PHYSICS D-APPLIED PHYSICS 34.1(2001):5-11.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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