Formation of Al-doped ZnO films by de magnetron reactive sputtering
文献类型:期刊论文
作者 | Chen, M ; Pei, ZL ; Sun, C ; Wen, LS ; Wang, X |
刊名 | MATERIALS LETTERS
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出版日期 | 2001 |
卷号 | 48期号:3-4页码:194-198 |
关键词 | OXIDE THIN-FILMS OPTICAL-PROPERTIES ELECTRICAL-PROPERTIES RF DC TRANSPARENT DEPOSITION |
ISSN号 | 0167-577X |
通讯作者 | Chen, M, Chinese Acad Sci, Shanghai Inst Met, Ion Beam Lab, Shanghai 200050, Peoples R China |
学科主题 | Materials Science, Multidisciplinary; Physics, Applied |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2012-03-24 |
源URL | [http://ir.sim.ac.cn/handle/331004/95706] ![]() |
专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
推荐引用方式 GB/T 7714 | Chen, M,Pei, ZL,Sun, C,et al. Formation of Al-doped ZnO films by de magnetron reactive sputtering[J]. MATERIALS LETTERS,2001,48(3-4):194-198. |
APA | Chen, M,Pei, ZL,Sun, C,Wen, LS,&Wang, X.(2001).Formation of Al-doped ZnO films by de magnetron reactive sputtering.MATERIALS LETTERS,48(3-4),194-198. |
MLA | Chen, M,et al."Formation of Al-doped ZnO films by de magnetron reactive sputtering".MATERIALS LETTERS 48.3-4(2001):194-198. |
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