中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Formation of Al-doped ZnO films by de magnetron reactive sputtering

文献类型:期刊论文

作者Chen, M ; Pei, ZL ; Sun, C ; Wen, LS ; Wang, X
刊名MATERIALS LETTERS
出版日期2001
卷号48期号:3-4页码:194-198
关键词OXIDE THIN-FILMS OPTICAL-PROPERTIES ELECTRICAL-PROPERTIES RF DC TRANSPARENT DEPOSITION
ISSN号0167-577X
通讯作者Chen, M, Chinese Acad Sci, Shanghai Inst Met, Ion Beam Lab, Shanghai 200050, Peoples R China
学科主题Materials Science, Multidisciplinary; Physics, Applied
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/95706]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Chen, M,Pei, ZL,Sun, C,et al. Formation of Al-doped ZnO films by de magnetron reactive sputtering[J]. MATERIALS LETTERS,2001,48(3-4):194-198.
APA Chen, M,Pei, ZL,Sun, C,Wen, LS,&Wang, X.(2001).Formation of Al-doped ZnO films by de magnetron reactive sputtering.MATERIALS LETTERS,48(3-4),194-198.
MLA Chen, M,et al."Formation of Al-doped ZnO films by de magnetron reactive sputtering".MATERIALS LETTERS 48.3-4(2001):194-198.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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