AlN thin films prepared by reactive ion beam coating
文献类型：期刊论文
| 作者 | Cheng,LL ; Yu,YH ; Sundaravel,B ; Luo,EZ ; Lin,S ; Lei,YM ; Ren,CX ; Cheung,WY ; Wong,SP ; Xu,JB ; Wilson,IH |
| 刊名 | FUNDAMENTAL MECHANISMS OF LOW-ENERGY-BEAM-MODIFIED SURFACE GROWTH AND PROCESSING
 |
| 出版日期 | 2000 |
| 卷号 | 585期号:0页码:251-256 |
| ISSN号 | 0272-9172 |
| 关键词 | AUGER-ELECTRON SPECTROSCOPY ALUMINUM NITRIDE DEPOSITION GROWTH |
| 通讯作者 | Cheng, LL, Chinese Acad Sci, Shanghai Inst Met, Ion Beam Lab, Shanghai, Peoples R China |
| 学科主题 | Materials Science ; Multidisciplinary |
| 收录类别 | SCI |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/95831]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Cheng,LL,Yu,YH,Sundaravel,B,et al. AlN thin films prepared by reactive ion beam coating[J]. FUNDAMENTAL MECHANISMS OF LOW-ENERGY-BEAM-MODIFIED SURFACE GROWTH AND PROCESSING,2000,585(0):251-256. |
| APA | Cheng,LL.,Yu,YH.,Sundaravel,B.,Luo,EZ.,Lin,S.,...&Wilson,IH.(2000).AlN thin films prepared by reactive ion beam coating.FUNDAMENTAL MECHANISMS OF LOW-ENERGY-BEAM-MODIFIED SURFACE GROWTH AND PROCESSING,585(0),251-256. |
| MLA | Cheng,LL,et al."AlN thin films prepared by reactive ion beam coating".FUNDAMENTAL MECHANISMS OF LOW-ENERGY-BEAM-MODIFIED SURFACE GROWTH AND PROCESSING 585.0(2000):251-256. |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。