Determination of microamount of silicon in steel by inductively coupled plasma-atomic emission spectrometry
文献类型：期刊论文
| 作者 | Gong, J ; Zhang, WL ; Qiu, DR ; Yang, PY ; Hu, K ; Wang, H ; You, JF |
| 刊名 | CHINESE JOURNAL OF ANALYTICAL CHEMISTRY
 |
| 出版日期 | 2000 |
| 卷号 | 28期号:8页码:971-973 |
| ISSN号 | 0253-3820 |
| 通讯作者 | Gong, J, Fudan Univ, Dept Chem, Shanghai 200433, Peoples R China |
| 学科主题 | Chemistry, Analytical |
| 收录类别 | SCI |
| 语种 | 中文 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/95845]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Gong, J,Zhang, WL,Qiu, DR,et al. Determination of microamount of silicon in steel by inductively coupled plasma-atomic emission spectrometry[J]. CHINESE JOURNAL OF ANALYTICAL CHEMISTRY,2000,28(8):971-973. |
| APA | Gong, J.,Zhang, WL.,Qiu, DR.,Yang, PY.,Hu, K.,...&You, JF.(2000).Determination of microamount of silicon in steel by inductively coupled plasma-atomic emission spectrometry.CHINESE JOURNAL OF ANALYTICAL CHEMISTRY,28(8),971-973. |
| MLA | Gong, J,et al."Determination of microamount of silicon in steel by inductively coupled plasma-atomic emission spectrometry".CHINESE JOURNAL OF ANALYTICAL CHEMISTRY 28.8(2000):971-973. |
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