Preparation of high quality amorphous Al2O3 thin film on silicon and its applications
文献类型：期刊论文
| 作者 | Wan, Q ; Zhang, NL ; Wang, LW ; Shen, QW ; Lin, CL |
| 刊名 | SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS
 |
| 出版日期 | 2001 |
| 页码 | 1468-1470 |
| 关键词 | CHEMICAL-VAPOR-DEPOSITION |
| 通讯作者 | Wan, Q, Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China |
| 学科主题 | Engineering, Electrical & Electronic; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/95737]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Wan, Q,Zhang, NL,Wang, LW,et al. Preparation of high quality amorphous Al2O3 thin film on silicon and its applications[J]. SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS,2001:1468-1470. |
| APA | Wan, Q,Zhang, NL,Wang, LW,Shen, QW,&Lin, CL.(2001).Preparation of high quality amorphous Al2O3 thin film on silicon and its applications.SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS,1468-1470. |
| MLA | Wan, Q,et al."Preparation of high quality amorphous Al2O3 thin film on silicon and its applications".SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS (2001):1468-1470. |
入库方式： OAI收割
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