中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Rotating compensator sampling for spectroscopic imaging ellipsometry

文献类型:会议论文

作者Meng YH(孟永宏); Jin G(靳刚)
出版日期2011
会议名称5th International Conference on Spectroscopic Ellipsometry
会议日期MAY 23-29, 2010
会议地点Albany, NY
通讯作者邮箱yhong@imech.ac.cn; gajin@imech.ac.cn
关键词Rotating compensator Spectroscopic imaging ellipsometry Spectroscopic ellipsometry Imaging ellipsometry Ellipsometry Nanofilm pattern
卷号519
期号9
页码2742-2745
通讯作者Jin, G (reprint author), Chinese Acad Sci, Inst Mech, 15 Bei Si Huan W Rd, Beijing 100190, Peoples R China
中文摘要In this work, a rotating compensator sampling for spectroscopic imaging ellipsometry (SIE) is presented and demonstrated by characterization of a SiO(2) nanofilm pattern on Si substrate. Experiment results within spectrum of 400-700 nm show that the rotating compensator sampling is valid for SIE to obtain the ellipsometric angle distributions psi (x, y, lambda) and Delta (x, y, lambda) over the thin film pattern, the sampling times of psi (x, y) and Delta (x, y) with 576 x 768 pixels under each wavelength is less than 8 s, the precision of fitting thickness of SiO(2) is about 0.2 nm and the lateral resolution is 60.9 mu m x 24.6 mu m in the parallel and perpendicular direction with respect to the incident plane. (C) 2010 Elsevier B.V. All rights reserved.
收录类别CPCI(ISTP)
产权排序Chinese Acad Sci, Inst Mech, Beijing 100190, Peoples R China; Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
会议主办者Univ Albany, Coll Nanoscale & Engn
会议网址http://dx.doi.org/10.1016/j.tsf.2010.12.131
会议录THIN SOLID FILMS
会议录出版者ELSEVIER SCIENCE SA
学科主题Materials Science, Multidisciplinary; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter
会议录出版地PO BOX 564, 1001 LAUSANNE, SWITZERLAND
语种英语
ISSN号0040-6090
源URL[http://dspace.imech.ac.cn/handle/311007/45326]  
专题力学研究所_国家微重力实验室
推荐引用方式
GB/T 7714
Meng YH,Jin G. Rotating compensator sampling for spectroscopic imaging ellipsometry[C]. 见:5th International Conference on Spectroscopic Ellipsometry. Albany, NY. MAY 23-29, 2010.http://dx.doi.org/10.1016/j.tsf.2010.12.131.

入库方式: OAI收割

来源:力学研究所

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