Influence of pH and abrasive concentration on polishing rate of amorphous Ge2Sb2Te5 film in chemical mechanical polishing
文献类型：期刊论文
| 作者 | Zhang,ZF ; Liu,WL ; Song,ZT |
| 刊名 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
 |
| 出版日期 | 2011 |
| 卷号 | 29期号:1页码:11020 |
| 关键词 | A V S AMER INST PHYSICS |
| ISSN号 | 1071-1023 |
| 学科主题 | Engineering ; Electrical & Electronic; Nanoscience & Nanotechnology; Physics ; Applied |
| 公开日期 | 2012-04-10 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/106759]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zhang,ZF,Liu,WL,Song,ZT. Influence of pH and abrasive concentration on polishing rate of amorphous Ge2Sb2Te5 film in chemical mechanical polishing[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2011,29(1):11020. |
| APA | Zhang,ZF,Liu,WL,&Song,ZT.(2011).Influence of pH and abrasive concentration on polishing rate of amorphous Ge2Sb2Te5 film in chemical mechanical polishing.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,29(1),11020. |
| MLA | Zhang,ZF,et al."Influence of pH and abrasive concentration on polishing rate of amorphous Ge2Sb2Te5 film in chemical mechanical polishing".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 29.1(2011):11020. |
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