Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films
文献类型：期刊论文
| 作者 | Wang,LY ; Liu,B ; Song,ZT ; Liu,WL ; Feng,SL ; Huang,D ; Babu,SV |
| 刊名 | ELECTROCHEMICAL AND SOLID STATE LETTERS
 |
| 出版日期 | 2011 |
| 卷号 | 14期号:3页码:H128-H131 |
| 关键词 | ELECTROCHEMICAL SOC INC |
| ISSN号 | 1099-0062 |
| 学科主题 | Electrochemistry; Materials Science ; Multidisciplinary |
| 公开日期 | 2012-04-10 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/106775]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Wang,LY,Liu,B,Song,ZT,et al. Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films[J]. ELECTROCHEMICAL AND SOLID STATE LETTERS,2011,14(3):H128-H131. |
| APA | Wang,LY.,Liu,B.,Song,ZT.,Liu,WL.,Feng,SL.,...&Babu,SV.(2011).Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films.ELECTROCHEMICAL AND SOLID STATE LETTERS,14(3),H128-H131. |
| MLA | Wang,LY,et al."Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films".ELECTROCHEMICAL AND SOLID STATE LETTERS 14.3(2011):H128-H131. |
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