中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Study on Interface Adhesion between Phase Change Material Film and SiO2 Layer by Nanoscratch Test

文献类型:期刊论文

作者Zhou,XL ; Wu,LC ; Song,ZT ; Rao,F ; Ren,K ; Peng,C ; Guo,XH ; Liu,B ; Feng,SL
刊名JAPANESE JOURNAL OF APPLIED PHYSICS
出版日期2011
卷号50期号:9页码:91402
关键词JAPAN SOC APPLIED PHYSICS
ISSN号0021-4922
学科主题Physics ; Applied
公开日期2012-04-10
源URL[http://ir.sim.ac.cn/handle/331004/106845]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Zhou,XL,Wu,LC,Song,ZT,et al. Study on Interface Adhesion between Phase Change Material Film and SiO2 Layer by Nanoscratch Test[J]. JAPANESE JOURNAL OF APPLIED PHYSICS,2011,50(9):91402.
APA Zhou,XL.,Wu,LC.,Song,ZT.,Rao,F.,Ren,K.,...&Feng,SL.(2011).Study on Interface Adhesion between Phase Change Material Film and SiO2 Layer by Nanoscratch Test.JAPANESE JOURNAL OF APPLIED PHYSICS,50(9),91402.
MLA Zhou,XL,et al."Study on Interface Adhesion between Phase Change Material Film and SiO2 Layer by Nanoscratch Test".JAPANESE JOURNAL OF APPLIED PHYSICS 50.9(2011):91402.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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