Study on Interface Adhesion between Phase Change Material Film and SiO2 Layer by Nanoscratch Test
文献类型:期刊论文
| 作者 | Zhou,XL ; Wu,LC ; Song,ZT ; Rao,F ; Ren,K ; Peng,C ; Guo,XH ; Liu,B ; Feng,SL |
| 刊名 | JAPANESE JOURNAL OF APPLIED PHYSICS
![]() |
| 出版日期 | 2011 |
| 卷号 | 50期号:9页码:91402 |
| 关键词 | JAPAN SOC APPLIED PHYSICS |
| ISSN号 | 0021-4922 |
| 学科主题 | Physics ; Applied |
| 公开日期 | 2012-04-10 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/106845] ![]() |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zhou,XL,Wu,LC,Song,ZT,et al. Study on Interface Adhesion between Phase Change Material Film and SiO2 Layer by Nanoscratch Test[J]. JAPANESE JOURNAL OF APPLIED PHYSICS,2011,50(9):91402. |
| APA | Zhou,XL.,Wu,LC.,Song,ZT.,Rao,F.,Ren,K.,...&Feng,SL.(2011).Study on Interface Adhesion between Phase Change Material Film and SiO2 Layer by Nanoscratch Test.JAPANESE JOURNAL OF APPLIED PHYSICS,50(9),91402. |
| MLA | Zhou,XL,et al."Study on Interface Adhesion between Phase Change Material Film and SiO2 Layer by Nanoscratch Test".JAPANESE JOURNAL OF APPLIED PHYSICS 50.9(2011):91402. |
入库方式: OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。

