Constructive Nanolithography by Chemically Modified Tips: Nanoelectrochemical Patterning on SAMs/Au
文献类型：期刊论文
| 作者 | Zheng ZK ; Yang ML ; Zhang BL |
| 刊名 | journal of physical chemistry c
 |
| 出版日期 | 2010 |
| 卷号 | 114期号:45页码:19220-19226 |
| 关键词 | SELF-ASSEMBLED MONOLAYERS DIP-PEN NANOLITHOGRAPHY ATOMIC-FORCE MICROSCOPY SCANNING PROBE LITHOGRAPHY ALKANETHIOL MONOLAYERS SILICON SURFACES AFM CANTILEVERS GOLD SURFACES OXIDATION TEMPLATES |
| ISSN号 | 1932-7447 |
| 通讯作者 | zhang bl |
| 中文摘要 | nanoelectrochemical patterning of 1-hexadecanethiol (hdt) monolayer on au(111) was realized by thiol-modified conductive atomic force microscopy (afm) tips in a fashion of mild oxidation of top methyl groups of the monolayers. pt-coated tips modified by a hydrophobic and appropriate thick monolayer of thiol (e.g., hdt) can significantly increase the bias threshold and extend the bias range suitable for the constructive nanolithography (cnl) in comparison with those tips unmodified or modified by hydrophilic monolayers. furthermore, the switchover from the cnl to the deep oxidation can be governed by the reductive desorption of thiol monolayers from the tip surface when appropriate thiol-modified tips are used. a hydrophobic hdt/tip can exhibit a cnl bias range with an extent of 5.3 v, much wider than the reported extents of the cnl bias ranges on octadecyl trichlorosilane (ots)/silicon surfaces by unmodified tips. the resulting cnl patterns were shown to have potential as multifunctional templates by guiding the self-assembly of ots and the site-defined immobilization of aminopropyltriethoxysilane-modified alpha-fe2o3 nanoparticles. |
| 收录类别 | SCI收录期刊论文 |
| 语种 | 英语 |
| WOS记录号 | WOS:000284018100010 |
| 公开日期 | 2012-04-25 |
| 源URL | [http://ir.ciac.jl.cn/handle/322003/43300]  |
| 专题 | 长春应用化学研究所_长春应用化学研究所知识产出_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zheng ZK,Yang ML,Zhang BL. Constructive Nanolithography by Chemically Modified Tips: Nanoelectrochemical Patterning on SAMs/Au[J]. journal of physical chemistry c,2010,114(45):19220-19226. |
| APA | Zheng ZK,Yang ML,&Zhang BL.(2010).Constructive Nanolithography by Chemically Modified Tips: Nanoelectrochemical Patterning on SAMs/Au.journal of physical chemistry c,114(45),19220-19226. |
| MLA | Zheng ZK,et al."Constructive Nanolithography by Chemically Modified Tips: Nanoelectrochemical Patterning on SAMs/Au".journal of physical chemistry c 114.45(2010):19220-19226. |
入库方式： OAI收割
来源：长春应用化学研究所
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