Influence of CH(4) on the morphology of nanocrystalline diamond films deposited by Ar rich microwave plasma
文献类型：期刊论文
| 作者 | Rakha, SA ; Yu, GJ ; Cao, JQ ; He, SX ; Zhou, XT |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 出版日期 | 2010 |
| 卷号 | 107期号:11页码:4 |
| 关键词 | crystal morphology diamond nanostructured materials Raman spectra scanning electron microscopy thin films |
| ISSN号 | 0021-8979 |
| 通讯作者 | Yu, GJ (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China |
| 学科主题 | Physics |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-04-11 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/6942]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2004-2010年 |
| 推荐引用方式 GB/T 7714 | Rakha, SA,Yu, GJ,Cao, JQ,et al. Influence of CH(4) on the morphology of nanocrystalline diamond films deposited by Ar rich microwave plasma[J]. JOURNAL OF APPLIED PHYSICS,2010,107(11):4. |
| APA | Rakha, SA,Yu, GJ,Cao, JQ,He, SX,&Zhou, XT.(2010).Influence of CH(4) on the morphology of nanocrystalline diamond films deposited by Ar rich microwave plasma.JOURNAL OF APPLIED PHYSICS,107(11),4. |
| MLA | Rakha, SA,et al."Influence of CH(4) on the morphology of nanocrystalline diamond films deposited by Ar rich microwave plasma".JOURNAL OF APPLIED PHYSICS 107.11(2010):4. |
入库方式： OAI收割
来源：上海应用物理研究所
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