Study on the mechanism of photo-degradation of p-nitrophenol exposed to 254 nm UV light
文献类型：期刊论文
| 作者 | Zhao, SF ; Ma, HJ ; Wang, M ; Cao, CQ ; Xiong, J ; Xu, YS ; Yao, SD |
| 刊名 | JOURNAL OF HAZARDOUS MATERIALS
 |
| 出版日期 | 2010 |
| 卷号 | 180期号:40546页码:5 |
| 关键词 | p-Nitrophenol Laser flash photolysis Photo-degradation Phenoxyl radical |
| ISSN号 | 0304-3894 |
| 通讯作者 | Yao, SD (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, POB 800-204,2019 Baojia Rd, Shanghai 201800, Peoples R China |
| 英文摘要 | The degradation mechanism of p-nitrophenol (p-NP) exposed to 254 nm UV light was studied in the presence and the absence of oxygen respectively via both steady-state photolysis and time-resolved laser flash photolysis (LFP) experiments. It has been confirmed that p-NP can be photo-ionized to produce its radical cation (p-NP(+center dot)) and hydrated electron (e(aq)(-)) with a quantum yield of 0.52. In neutral solution p-NP(+center dot) will be quickly deprotonated to form its phenoxyl radical (p-NP(center dot)) which will react with oxygen to promote the breakage of benzene ring of p-NP. The degradation efficiency of p-NP exposed to 254 nm UV is as low as commonly reported. However, oxygen could improve the photo-degradation efficiency, which is due to the reaction of oxygen with p-NP(center dot). The reaction between oxygen and p-NP(center dot) has been experimentally confirmed both in LFP and in pulse radiolysis. Crown Copyright (C) 2010 Published by Elsevier B.V. All rights reserved. |
| 学科主题 | Engineering; Environmental Sciences & Ecology |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000279459600008 |
| 公开日期 | 2012-04-11 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/7068]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2004-2010年 |
| 推荐引用方式 GB/T 7714 | Zhao, SF,Ma, HJ,Wang, M,et al. Study on the mechanism of photo-degradation of p-nitrophenol exposed to 254 nm UV light[J]. JOURNAL OF HAZARDOUS MATERIALS,2010,180(40546):5. |
| APA | Zhao, SF.,Ma, HJ.,Wang, M.,Cao, CQ.,Xiong, J.,...&Yao, SD.(2010).Study on the mechanism of photo-degradation of p-nitrophenol exposed to 254 nm UV light.JOURNAL OF HAZARDOUS MATERIALS,180(40546),5. |
| MLA | Zhao, SF,et al."Study on the mechanism of photo-degradation of p-nitrophenol exposed to 254 nm UV light".JOURNAL OF HAZARDOUS MATERIALS 180.40546(2010):5. |
入库方式： OAI收割
来源：上海应用物理研究所
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