中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Microscopic model for the ferroelectric field effect in oxide heterostructures

文献类型:期刊论文

作者S. Dong ; X. T. Zhang ; R. Yu ; J. M. Liu ; E. Dagotto
刊名Physical Review B
出版日期2011
卷号84期号:15
关键词effect transistor effect devices thin-films electronics interfaces manganites states phase
ISSN号1098-0121
中文摘要A microscopic model Hamiltonian for the ferroelectric field effect is introduced for the study of oxide heterostructures with ferroelectric components. The long-range Coulomb interaction is incorporated as an electrostatic potential, solved self-consistently together with the charge distribution. A generic double-exchange system is used as the conducting channel, epitaxially attached to the ferroelectric gate. The observed ferroelectric screening effect, namely, the charge accumulation/depletion near the interface, is shown to drive interfacial phase transitions that give rise to robust magnetoelectric responses and bipolar resistive switching, in qualitative agreement with previous density functional theory calculations. The model can be easily adapted to other materials by modifying the Hamiltonian of the conducting channel, and it is useful in simulating ferroelectric field effect devices particularly those involving strongly correlated electronic components where ab initio techniques are difficult to apply.
原文出处://WOS:000295872800008
公开日期2012-04-13
源URL[http://ir.imr.ac.cn/handle/321006/30305]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
S. Dong,X. T. Zhang,R. Yu,et al. Microscopic model for the ferroelectric field effect in oxide heterostructures[J]. Physical Review B,2011,84(15).
APA S. Dong,X. T. Zhang,R. Yu,J. M. Liu,&E. Dagotto.(2011).Microscopic model for the ferroelectric field effect in oxide heterostructures.Physical Review B,84(15).
MLA S. Dong,et al."Microscopic model for the ferroelectric field effect in oxide heterostructures".Physical Review B 84.15(2011).

入库方式: OAI收割

来源:金属研究所

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