中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Perhydropolysilazane derived silica coating protecting Kapton from atomic oxygen attack

文献类型:期刊论文

作者L. F. Hu ; M. S. Li ; C. H. Xu ; Y. M. Luo
刊名Thin Solid Films
出版日期2011
卷号520期号:3页码:1063-1068
关键词Perhydropolysilazane Kapton Atomic oxygen Sol-gel Erosion yield low-earth-orbit surface modification spacecraft materials erosion resistance plasma films polysilazane precursors polymers
ISSN号0040-6090
中文摘要By using surface sol-gel method with perhydropolysilazane (PHPS) as a precursor, a silica coating was prepared on a Kapton substrate as an atomic oxygen (AO) protective coating. The AO exposure tests were conducted in a ground-based simulator. It is found that the erosion yield of Kapton decreases by about three orders of magnitude after the superficial application of the coating. After AO exposure, the surface of the coating is smooth and uniform, no surface shrinkage induced cracks or undercutting erosion are observed. This is because that during AO exposure the PHPS is oxidized directly to form SiO(2) without through intermediate reaction processes, the surface shrinkage and cracking tendency are prohibited. Meanwhile, this PHPS derived silica coating also presents self-healing effect due to the oxidation of free Si. Compared with other kinds of silica or organic polymer coatings, this PHPS derived silica coating exhibits a superior AO erosion resistance. (C) 2011 Elsevier B.V. All rights reserved.
原文出处://WOS:000298486600030
公开日期2012-04-13
源URL[http://210.72.142.130/handle/321006/30394]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
L. F. Hu,M. S. Li,C. H. Xu,et al. Perhydropolysilazane derived silica coating protecting Kapton from atomic oxygen attack[J]. Thin Solid Films,2011,520(3):1063-1068.
APA L. F. Hu,M. S. Li,C. H. Xu,&Y. M. Luo.(2011).Perhydropolysilazane derived silica coating protecting Kapton from atomic oxygen attack.Thin Solid Films,520(3),1063-1068.
MLA L. F. Hu,et al."Perhydropolysilazane derived silica coating protecting Kapton from atomic oxygen attack".Thin Solid Films 520.3(2011):1063-1068.

入库方式: OAI收割

来源:金属研究所

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