Perhydropolysilazane derived silica coating protecting Kapton from atomic oxygen attack
文献类型:期刊论文
作者 | L. F. Hu ; M. S. Li ; C. H. Xu ; Y. M. Luo |
刊名 | Thin Solid Films
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出版日期 | 2011 |
卷号 | 520期号:3页码:1063-1068 |
关键词 | Perhydropolysilazane Kapton Atomic oxygen Sol-gel Erosion yield low-earth-orbit surface modification spacecraft materials erosion resistance plasma films polysilazane precursors polymers |
ISSN号 | 0040-6090 |
中文摘要 | By using surface sol-gel method with perhydropolysilazane (PHPS) as a precursor, a silica coating was prepared on a Kapton substrate as an atomic oxygen (AO) protective coating. The AO exposure tests were conducted in a ground-based simulator. It is found that the erosion yield of Kapton decreases by about three orders of magnitude after the superficial application of the coating. After AO exposure, the surface of the coating is smooth and uniform, no surface shrinkage induced cracks or undercutting erosion are observed. This is because that during AO exposure the PHPS is oxidized directly to form SiO(2) without through intermediate reaction processes, the surface shrinkage and cracking tendency are prohibited. Meanwhile, this PHPS derived silica coating also presents self-healing effect due to the oxidation of free Si. Compared with other kinds of silica or organic polymer coatings, this PHPS derived silica coating exhibits a superior AO erosion resistance. (C) 2011 Elsevier B.V. All rights reserved. |
原文出处 | |
公开日期 | 2012-04-13 |
源URL | [http://210.72.142.130/handle/321006/30394] ![]() |
专题 | 金属研究所_中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | L. F. Hu,M. S. Li,C. H. Xu,et al. Perhydropolysilazane derived silica coating protecting Kapton from atomic oxygen attack[J]. Thin Solid Films,2011,520(3):1063-1068. |
APA | L. F. Hu,M. S. Li,C. H. Xu,&Y. M. Luo.(2011).Perhydropolysilazane derived silica coating protecting Kapton from atomic oxygen attack.Thin Solid Films,520(3),1063-1068. |
MLA | L. F. Hu,et al."Perhydropolysilazane derived silica coating protecting Kapton from atomic oxygen attack".Thin Solid Films 520.3(2011):1063-1068. |
入库方式: OAI收割
来源:金属研究所
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