中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Bismuth segregation enhances intermetallic compound growth in SnBi/Cu microelectronic interconnect

文献类型:期刊论文

作者T. Y. Kang ; Y. Y. Xiu ; C. Z. Liu ; L. Hui ; J. J. Wang ; W. P. Tong
刊名Journal of Alloys and Compounds
出版日期2011
卷号509期号:5页码:1785-1789
关键词Bi segregation Interconnect Kinetics Intermetallic compound growth lead-free solders cu
ISSN号0925-8388
中文摘要There was a sudden increase of intermetallic compound (IMC) Cu(6)Sn(5) growth rate in the eutectic Sn58wt. %Bi/Cu joint during aging process. With aging time increasing, Bi accumulated at the Cu(3)Sn/Cu interface and gradually induced the fracture mode of the joint to change from ductile to brittle one along this interface. Bi segregation enhanced IMC Cu(6)Sn(5) growth by means of promoting the interfacial reaction at Cu(3)Sn/Cu interface, which was concluded from IMCs (Cu(6)Sn(5) and Cu(3)Sn) growth behavior for pure Sn/Cu and Sn10wt. %Bi/Cu interconnects at the same temperature. (C) 2010 Elsevier B.V. All rights reserved.
原文出处://WOS:000287167700090
公开日期2012-04-13
源URL[http://210.72.142.130/handle/321006/30430]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
T. Y. Kang,Y. Y. Xiu,C. Z. Liu,et al. Bismuth segregation enhances intermetallic compound growth in SnBi/Cu microelectronic interconnect[J]. Journal of Alloys and Compounds,2011,509(5):1785-1789.
APA T. Y. Kang,Y. Y. Xiu,C. Z. Liu,L. Hui,J. J. Wang,&W. P. Tong.(2011).Bismuth segregation enhances intermetallic compound growth in SnBi/Cu microelectronic interconnect.Journal of Alloys and Compounds,509(5),1785-1789.
MLA T. Y. Kang,et al."Bismuth segregation enhances intermetallic compound growth in SnBi/Cu microelectronic interconnect".Journal of Alloys and Compounds 509.5(2011):1785-1789.

入库方式: OAI收割

来源:金属研究所

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