Corrosion behaviour of copper under chloride-containing thin electrolyte layer
文献类型：期刊论文
| 作者 | X. N. Liao ; F. H. Cao ; L. Y. Zheng ; W. J. Liu ; A. N. Chen ; J. Q. Zhang ; C. A. Cao |
| 刊名 | Corrosion Science
 |
| 出版日期 | 2011 |
| 卷号 | 53期号:10页码:3289-3298 |
| ISSN号 | 0010-938X |
| 关键词 | Copper EIS Polarization Atmospheric corrosion electrochemical impedance spectroscopy atmospheric corrosion metal-surfaces pitting corrosion patinated copper sodium-chloride nacl solution kelvin probe ac-impedance fe-sem |
| 中文摘要 | The corrosion behaviour of copper under chloride-containing thin electrolyte layers (TEL) was investigated using electrochemical impedance spectroscopy (EIS), cathodic polarization, linear polarization, SEM/EDS and XRD. The results indicate that the copper corrosion rate increases as TEL thickness decreases during the initial stages. After 192 h of immersion, the corrosion rate of copper under TEL in this order: 300 > 402 > 199 > bulk solution > 101 mu m. The corrosion behaviour is uniform under TEL and pitting is the primary corrosion type in the bulk solution. A corrosion model of the behaviour of copper under chloride-containing TEL is proposed. (C) 2011 Elsevier Ltd. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://210.72.142.130/handle/321006/30501]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | X. N. Liao,F. H. Cao,L. Y. Zheng,et al. Corrosion behaviour of copper under chloride-containing thin electrolyte layer[J]. Corrosion Science,2011,53(10):3289-3298. |
| APA | X. N. Liao.,F. H. Cao.,L. Y. Zheng.,W. J. Liu.,A. N. Chen.,...&C. A. Cao.(2011).Corrosion behaviour of copper under chloride-containing thin electrolyte layer.Corrosion Science,53(10),3289-3298. |
| MLA | X. N. Liao,et al."Corrosion behaviour of copper under chloride-containing thin electrolyte layer".Corrosion Science 53.10(2011):3289-3298. |
入库方式： OAI收割
来源：金属研究所
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