中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Scaling of reliability of gold interconnect lines subjected to alternating current

文献类型:期刊论文

作者M. Wang ; B. Zhang ; G. P. Zhang ; C. S. Liu
刊名Applied Physics Letters
出版日期2011
卷号99期号:1
关键词thermal fatigue damage thin metal-films fracture surfaces behavior failure
ISSN号0003-6951
中文摘要We present an investigation of damage morphologies of small-scale gold interconnect lines subjected to thermal fatigue strain generated by alternating current. Fractal dimension analysis reveals a general scaling relation between the critical strain range causing thermal fatigue damage and the ratio of the width to the thickness of the metal line. Such the scaling rule may be useful in controlling reliability of the metal interconnect lines subjected to long-term thermal cyclic strain. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3609779]
原文出处://WOS:000292639200023
公开日期2012-04-13
源URL[http://210.72.142.130/handle/321006/30733]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
M. Wang,B. Zhang,G. P. Zhang,et al. Scaling of reliability of gold interconnect lines subjected to alternating current[J]. Applied Physics Letters,2011,99(1).
APA M. Wang,B. Zhang,G. P. Zhang,&C. S. Liu.(2011).Scaling of reliability of gold interconnect lines subjected to alternating current.Applied Physics Letters,99(1).
MLA M. Wang,et al."Scaling of reliability of gold interconnect lines subjected to alternating current".Applied Physics Letters 99.1(2011).

入库方式: OAI收割

来源:金属研究所

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