Ti/TiN multilayer thin films deposited by pulse biased arc ion plating
文献类型：期刊论文
| 作者 | Y. H. Zhao ; G. Q. Lin ; J. Q. Xiao ; H. Du ; C. A. Dong ; L. J. Gao |
| 刊名 | Applied Surface Science
 |
| 出版日期 | 2011 |
| 卷号 | 257期号:7页码:2683-2688 |
| 关键词 | Multilayer films Pulse biased arc ion plating Hardness Adhesion mechanical-properties tin films coatings nanoindentation microhardness constitution alloy field dc |
| ISSN号 | 0169-4332 |
| 中文摘要 | In this work, the effect of modulation period (A) on Ti/TiN multilayer films deposited on high-speed-steel (HSS) substrates using pulse biased arc ion plating is reported. The crystallography structures and crosssectional morphology of Ti/TiN multilayer films were characterized by X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM), respectively. Their mechanical properties were determined via nanoindentation measurements, while the film/substrate adhesion via the scratch test. It was found that the highest hardness value reached 43 GPa for the modulation period of 54 nm, while the film/substrate adhesion also reached the highest value of 83 N. Furthermore, the hardness enhancement mechanism in the multilayer films is discussed. (C) 2010 Elsevier B.V. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://210.72.142.130/handle/321006/30957]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Y. H. Zhao,G. Q. Lin,J. Q. Xiao,et al. Ti/TiN multilayer thin films deposited by pulse biased arc ion plating[J]. Applied Surface Science,2011,257(7):2683-2688. |
| APA | Y. H. Zhao,G. Q. Lin,J. Q. Xiao,H. Du,C. A. Dong,&L. J. Gao.(2011).Ti/TiN multilayer thin films deposited by pulse biased arc ion plating.Applied Surface Science,257(7),2683-2688. |
| MLA | Y. H. Zhao,et al."Ti/TiN multilayer thin films deposited by pulse biased arc ion plating".Applied Surface Science 257.7(2011):2683-2688. |
入库方式： OAI收割
来源：金属研究所
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