Synthesis of titanium nitride thin films deposited by a new shielded arc ion plating
文献类型：期刊论文
| 作者 | Y. H. Zhao ; G. Q. Lin ; J. Q. Xiao ; W. C. Lang ; C. A. Dong ; J. Gong ; C. Sun |
| 刊名 | Applied Surface Science
 |
| 出版日期 | 2011 |
| 卷号 | 257期号:13页码:5694-5697 |
| 关键词 | Shielded arc ion plating TiN Thin films Deposition rate Droplet particles Adhesion cathodic arc reactive vacuum |
| ISSN号 | 0169-4332 |
| 中文摘要 | Thin films of titanium nitride (TiN) were deposited on stainless steel substrates by a modified deposition technique, double-layered shielded arc ion plating with vicarious circular holes (DL-SAIP). The results show that the TiN film with the distance of 10mm between the double-layered shield plates had the least droplets. The deposition rate of the films prepared with the new technique was more homogeneous than that of all the other shielded arc ion plating. The film/substrate adhesion and microhardness values of the TiN films were higher than 40N and 18 GPa, respectively. Thus such TiN thin films can be expected in applications. Crown Copyright (C) 2011 Published by Elsevier B. V. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://210.72.142.130/handle/321006/30958]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Y. H. Zhao,G. Q. Lin,J. Q. Xiao,et al. Synthesis of titanium nitride thin films deposited by a new shielded arc ion plating[J]. Applied Surface Science,2011,257(13):5694-5697. |
| APA | Y. H. Zhao.,G. Q. Lin.,J. Q. Xiao.,W. C. Lang.,C. A. Dong.,...&C. Sun.(2011).Synthesis of titanium nitride thin films deposited by a new shielded arc ion plating.Applied Surface Science,257(13),5694-5697. |
| MLA | Y. H. Zhao,et al."Synthesis of titanium nitride thin films deposited by a new shielded arc ion plating".Applied Surface Science 257.13(2011):5694-5697. |
入库方式： OAI收割
来源：金属研究所
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