Ti-Cu-N hard nanocomposite films prepared by pulse biased arc ion plating
文献类型：期刊论文
| 作者 | Y. H. Zhao ; X. Q. Wang ; J. Q. Xiao ; B. H. Yu ; F. Q. Li |
| 刊名 | Applied Surface Science
 |
| 出版日期 | 2011 |
| 卷号 | 258期号:1页码:370-376 |
| ISSN号 | 0169-4332 |
| 关键词 | Pulse biased arc ion plating Nanocomposite films Ti-Cu-N Hardness mechanical-properties superhard materials coatings deposition dc microstructure bombardment morphology titanium design |
| 中文摘要 | In this work, Ti-Cu-N hard nanocomposite films were deposited on high-speed-steel (HSS) substrates using a TiCu (88: 12 at.%) single multi-component target by pulse biased arc ion plating. The influence of pulse bias voltages was examined with regard to elemental composition, structure, morphology and mechanical properties of the films. The Cu atomic content of Ti-Cu-N films was determined by Electron Probe Micro-Analyzer (EPMA). The structure and morphology were examined by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Hardness and film/substrate adhesion were determined by nanoindenter and scratch test, respectively. The results showed that the content of Cu appeared to be in the range of 1.75-4.5 at.%, depending on pulse bias voltages. The films exhibit a preferred orientation TiN (1 1 1) texture when the substrate bias voltages were -100 V and -300 V, while the preferred orientation change to be a preferred orientation TiN (2 2 0) one when the substrate bias voltages increase to -600 V and -900 V. And no obvious sign of metal copper phase was observed. The SEM morphologies showed some macroparticles (MPs) on the surface of the films and the relative content of the MPs decreased significantly when the substrate bias voltages increased from -100 to -900 V. The maximum value (74 N) of the film/substrate adhesion of the films was obtained when the substrate bias voltage was -600 V with Cu content of 1.75 at.%. Hardness enhancement was observed, the value of the hardness increased firstly and reached a maximum value of 31.5 GPa, corresponding to Cu content of 1.75 at.%, and then it decreased when the substrate bias voltage changed from -100 to -900 V. The hardness enhancement was discussed related to the concept for the design of hard materials. Crown Copyright (C) 2011 Published by Elsevier B. V. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://210.72.142.130/handle/321006/30959]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Y. H. Zhao,X. Q. Wang,J. Q. Xiao,et al. Ti-Cu-N hard nanocomposite films prepared by pulse biased arc ion plating[J]. Applied Surface Science,2011,258(1):370-376. |
| APA | Y. H. Zhao,X. Q. Wang,J. Q. Xiao,B. H. Yu,&F. Q. Li.(2011).Ti-Cu-N hard nanocomposite films prepared by pulse biased arc ion plating.Applied Surface Science,258(1),370-376. |
| MLA | Y. H. Zhao,et al."Ti-Cu-N hard nanocomposite films prepared by pulse biased arc ion plating".Applied Surface Science 258.1(2011):370-376. |
入库方式： OAI收割
来源：金属研究所
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