中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The synthesis of LiBH(4) films under low hydrogen pressure at ambient temperature

文献类型:期刊论文

作者W. Haiping ; W. Weidong ; L. Tiecheng ; W. Xuemin ; G. Fangfang ; C. Linhong ; B. Li ; D. Yang
刊名Materials Letters
出版日期2010
卷号64期号:3页码:320-322
关键词Lithium borohydride Pulsed laser deposition Thin films Deposition deposition
ISSN号0167-577X
中文摘要Lithium borohydride (LiBH(4)) films were first fabricated under low hydrogen pressure (5-70 Pa) at ambient temperature by pulsed laser deposition (PLD). The atomistic structures and chemical compositions of the films were investigated. It was found that during the formation process of LiBH(4), the intermediate compound Li(2)B(12)H(12) was formed. As the hydrogen pressure increased up to 70 Pa. the relative weight percent of LiBH(4) was over 70 wt.% even at ambient temperature. Moreover, the stress of the films was decreased as the hydrogen pressure increased. (C) 2009 Elsevier B.V. All rights reserved.
原文出处://WOS:000274164500028
公开日期2012-04-13
源URL[http://210.72.142.130/handle/321006/31132]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
W. Haiping,W. Weidong,L. Tiecheng,et al. The synthesis of LiBH(4) films under low hydrogen pressure at ambient temperature[J]. Materials Letters,2010,64(3):320-322.
APA W. Haiping.,W. Weidong.,L. Tiecheng.,W. Xuemin.,G. Fangfang.,...&D. Yang.(2010).The synthesis of LiBH(4) films under low hydrogen pressure at ambient temperature.Materials Letters,64(3),320-322.
MLA W. Haiping,et al."The synthesis of LiBH(4) films under low hydrogen pressure at ambient temperature".Materials Letters 64.3(2010):320-322.

入库方式: OAI收割

来源:金属研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。