Heavily Nitrogen-Doped Titanium Oxide Thin Films by Reactive Sputtering and Excimer Laser Annealing
文献类型：期刊论文
| 作者 | Q. Li ; J. K. Shang |
| 刊名 | Journal of the American Ceramic Society
 |
| 出版日期 | 2010 |
| 卷号 | 93期号:10页码:3039-3042 |
| 关键词 | visible-light photocatalytic activity optical-properties tio2 dioxide powders oxidation water |
| ISSN号 | 0002-7820 |
| 中文摘要 | A novel nonequilibrium approach combining low-temperature reactive sputtering and excimer laser annealing was developed to resolve the opposing requirements on crystallization and minimization of dopant loss for creating heavily nitrogen-doped TiO(2) (TiON) thin film. By retaining nitrogen dopant concentration in the sputtered film, the laser annealing allowed exploration of new material chemistry not generally available to the conventional approaches. Compared with the traditional thermal annealing, the excimer laser annealing created TiON thin film samples with a higher nitrogen dopant concentration, better crystallization, higher visible light absorbance, and faster degradation effect on organic pollutants. The crystallization process from excimer laser annealing was carried out at room temperature with minimal damage to the substrate, thus applicable to plastic/organic substrates. This approach could be easily applied to other dopant/thin film/substrate systems, opening up an unexplored avenue for creating thin films with novel properties for a broad range of potential technological applications. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://210.72.142.130/handle/321006/31232]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Q. Li,J. K. Shang. Heavily Nitrogen-Doped Titanium Oxide Thin Films by Reactive Sputtering and Excimer Laser Annealing[J]. Journal of the American Ceramic Society,2010,93(10):3039-3042. |
| APA | Q. Li,&J. K. Shang.(2010).Heavily Nitrogen-Doped Titanium Oxide Thin Films by Reactive Sputtering and Excimer Laser Annealing.Journal of the American Ceramic Society,93(10),3039-3042. |
| MLA | Q. Li,et al."Heavily Nitrogen-Doped Titanium Oxide Thin Films by Reactive Sputtering and Excimer Laser Annealing".Journal of the American Ceramic Society 93.10(2010):3039-3042. |
入库方式： OAI收割
来源：金属研究所
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