中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
RESIDUAL STRESS AND MAGNETIC PROPERTIES OF Fe-Ga THIN FILMS

文献类型:期刊论文

作者B. W. Wang ; S. Y. Cao ; W. M. Huang ; L. Weng ; Y. Sun
刊名International Journal of Modern Physics B
出版日期2010
卷号24期号:15-16页码:2380-2385
关键词Fe-Ga thin film residual stress magnetic property magnetostriction magnetostriction alloys
ISSN号0217-9792
中文摘要Fe-Ga thin films were prepared by DC magnetron sputtering on Si (100) substrate and an alloy target consisting of Fe(81)Ga(19) was used. X-ray diffraction techniques were used to quantify the strain in the Fe-Ga thin films by measuring the interplanar spacings of select crystallographic planes. The interplanar spacing, d, for the family of Fe-Ga {211} planes was measured. Using the well-established sin(2)psi technique, the residual stress of the Fe-Ga thin films was calculated. It has been found that the stress for Fe-Ga thin films quickly increases with increasing the sputtering power. The residual stress of thin films is almost unchanged in the range of 220-440 nm, and then it decreases with increasing the thickness of thin films.
原文出处://WOS:000282197000026
公开日期2012-04-13
源URL[http://ir.imr.ac.cn/handle/321006/31490]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
B. W. Wang,S. Y. Cao,W. M. Huang,et al. RESIDUAL STRESS AND MAGNETIC PROPERTIES OF Fe-Ga THIN FILMS[J]. International Journal of Modern Physics B,2010,24(15-16):2380-2385.
APA B. W. Wang,S. Y. Cao,W. M. Huang,L. Weng,&Y. Sun.(2010).RESIDUAL STRESS AND MAGNETIC PROPERTIES OF Fe-Ga THIN FILMS.International Journal of Modern Physics B,24(15-16),2380-2385.
MLA B. W. Wang,et al."RESIDUAL STRESS AND MAGNETIC PROPERTIES OF Fe-Ga THIN FILMS".International Journal of Modern Physics B 24.15-16(2010):2380-2385.

入库方式: OAI收割

来源:金属研究所

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