中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effect of direct electric current on wetting behavior of molten Bi on Cu substrate

文献类型:期刊论文

作者Q. G. Xu ; X. B. Liu ; H. F. Zhang
刊名Transactions of Nonferrous Metals Society of China
出版日期2010
卷号20期号:8页码:1452-1457
关键词wetting dissolution surface and interface spreading wettability
ISSN号1003-6326
中文摘要The effect of direct electric current on the wetting behavior of molten Bi on Cu substrate at 370 degrees C was investigated by the sessile drop method. The wettability of molten Bi on Cu without an applied current is poor and the spreading time required to form the steady-state contact angle (about 102 degrees) is approximately 30 min With the increase of the applied electric current, the spreading of molten Bi on Cu is accelerated significantly and the steady-state contact angle decreases considerably. The cross-section SEM micrographs of the solidified Bi droplet on Cu substrate show that the electric current has a marked effect on the convection of melt. Correspondingly, the application of an electric current obviously enhances the dissolution of Cu into Bi melt, which may change the wetting triple line configuration. The improvement of wettability induced by electric current is also related to the additional driving force for wetting provided by the electromagnetic pressure gradient force.
原文出处://WOS:000282036100016
公开日期2012-04-13
源URL[http://210.72.142.130/handle/321006/31612]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
Q. G. Xu,X. B. Liu,H. F. Zhang. Effect of direct electric current on wetting behavior of molten Bi on Cu substrate[J]. Transactions of Nonferrous Metals Society of China,2010,20(8):1452-1457.
APA Q. G. Xu,X. B. Liu,&H. F. Zhang.(2010).Effect of direct electric current on wetting behavior of molten Bi on Cu substrate.Transactions of Nonferrous Metals Society of China,20(8),1452-1457.
MLA Q. G. Xu,et al."Effect of direct electric current on wetting behavior of molten Bi on Cu substrate".Transactions of Nonferrous Metals Society of China 20.8(2010):1452-1457.

入库方式: OAI收割

来源:金属研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。