Comparative Study of the Superhydrophobic-Modification of Silicone Rubber Surfaces by CF(4) ICP and CCP
文献类型：期刊论文
| 作者 | S. H. Gao ; K. S. Zhou ; M. K. Lei ; L. S. Wen |
| 刊名 | Plasma Processes and Polymers
 |
| 出版日期 | 2009 |
| 卷号 | 6期号:8页码:530-536 |
| 关键词 | AFM CF(4) ICP and CCP silicon rubber superhydrophobic modification surface modification XPS plasma treatment outdoor insulators gas plasma polymers films fluorination energy |
| ISSN号 | 1612-8850 |
| 中文摘要 | Super-hydrophobic surface-modification of silicone rubber (SIR) as an outdoor insulator by CF(4) radio frequency (RF) inductively coupled plasma (ICP) and capacitively coupled plasma (CCP) has been studied. X-Ray photoelectron spectroscopy, atomic force microscopy, and static contact angle measurements were employed to characterize the changes of the surface chemical composition, topography, and hydrophobicity. The results show that etching or ablation and fluorination are parallel and competitive during both treatments. The improvement of hydrophobicity is ascribed to the coaction of the increase of surface roughness and the introduction of fluoric groups (C-CF(n)) or structures (Si-F and Si-F(2)). It is also found that the ratio of [Si-F]/[C-F] and the increase of surface roughness of the SIR treated by CCP are higher than that by ICP, which leads to a greater hydrophobic modification effect by the CCP process. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://210.72.142.130/handle/321006/31927]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | S. H. Gao,K. S. Zhou,M. K. Lei,et al. Comparative Study of the Superhydrophobic-Modification of Silicone Rubber Surfaces by CF(4) ICP and CCP[J]. Plasma Processes and Polymers,2009,6(8):530-536. |
| APA | S. H. Gao,K. S. Zhou,M. K. Lei,&L. S. Wen.(2009).Comparative Study of the Superhydrophobic-Modification of Silicone Rubber Surfaces by CF(4) ICP and CCP.Plasma Processes and Polymers,6(8),530-536. |
| MLA | S. H. Gao,et al."Comparative Study of the Superhydrophobic-Modification of Silicone Rubber Surfaces by CF(4) ICP and CCP".Plasma Processes and Polymers 6.8(2009):530-536. |
入库方式： OAI收割
来源：金属研究所
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